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Plasma
Sensor

High-precision plasma monitoring sensors providing real-time measurement of plasma parameters with sub-millisecond response time.

10 Msps
Sampling Rate
4 CH
Simultaneous Channels
Real-time
Process Diagnostics

High-Speed Arc Monitoring System

Optical Emission Monitoring
Real-time optical emission spectroscopy for plasma state characterization and process stability tracking.
Plasma Stability Analysis
Continuous analysis of plasma uniformity and stability to ensure consistent process conditions across the chamber.
Arc Detection
Ultra-fast arc event detection with microsecond-level response to protect equipment and prevent process excursions.
Real-time Process Diagnostics
Integrated diagnostics dashboard providing live process health metrics and anomaly alerts for smart manufacturing.

Semiconductor Process Compatibility

PECVD
Plasma-Enhanced
Chemical Vapor Deposition
Etch
Plasma Etch
& Dry Strip Processes
PVD
Physical Vapor
Deposition (Sputtering)

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