Advanced plasma power and monitoring solutions
for next-generation semiconductor manufacturing
PLAI delivers industry-leading hardware engineered for the demands of advanced semiconductor fabrication processes.
High-precision plasma monitoring sensors providing real-time measurement of plasma parameters with sub-millisecond response time.
High-efficiency RF power generators for plasma generation, featuring advanced impedance matching and ultra-stable output.
End-to-end plasma management systems combining sensing, power control, and data analytics in a unified platform.
Sub-millisecond measurement response enabling real-time process control for critical fabrication steps.
Industry-leading ±0.1% measurement accuracy for consistent process repeatability at scale.
Real-time dashboard with anomaly detection and predictive maintenance alerts to maximize uptime.
Designed to semiconductor industry standards with CE, FCC certification and full quality traceability.
Scalable, plug-and-play modules that integrate seamlessly into existing fab infrastructure.
Advanced analytics and reporting tools for process optimization and yield improvement insights.
(주)플라이는 반도체 제조 공정의 핵심 기술인 플라즈마 파워 및 모니터링 분야에서 혁신을 이끌어가는 기술 스타트업입니다.
We develop cutting-edge plasma sensors and power generators that empower semiconductor manufacturers to achieve greater precision, efficiency, and yield in their production processes.
Have a project in mind or want to learn more about our products? Our engineering team is ready to help.